Extremely reactive photoinitiator which has almost identical photochemical properties and reactivity to 369. 379 is more soluble that 369 and is described as a low-emission amino ketone (LE-AK). 379 is easily sensitised in the long wave UV by small amounts of thioxanthone. This sensitisation effect increases its reactivity significantly and leads to very high cure speeds that can be utilised in high-speed offset litho and flexo inks.